The properties of surface atoms are usually different from those of the same atoms in the bulk. It is important to have the means to measure those properties. The surfaces of solids play a remarkably large number of processes, phenomena, and materials of technological importance. These include catalysis, corrosion, adhesion, microelectronics, composites, thin films, and solid surface reactions. In all the above examples, it is necessary to analyze the surface which finally meets the technological requirements for a purposefully changed surface. A wealth of analytical methods is available to the analyst, and the choice of the method appropriate for the solution of his problem requires a basic knowledge on the methods, techniques and procedures of surface and thin-film analysis. Since this reasons, to inform the students about this topic will be beneficial.

Introduction, Photoelectron Spectroscopy (XPS), Auger Electron Spectroscopy (AES), Static Secondary Ion Mass Spectrometry (SSIMS), Dynamic Secondary Ion Mass Spectrometry (SIMS), X-ray Fluorescence Spectroscopy (XRF), Scanning Electron Microscopy (SEM), Energy-dispersive X-ray Spectroscopy (EDXS), X-ray Diffraction (XRD), Surface-Enhanced Raman Scattering (SERS), Atomic Force Microscopy (AFM), Scanning Tunneling Microscopy (STM), Comparison of Techniques.